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| Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique 期刊论文 Rare Metal Materials and Engineering, 2012, 卷号: 41, 期号: 增刊:1, 页码: 366-370 Authors: Wang YX(王永霞); Ye YP(冶银平); Li HX(李红轩); Ji L(吉利); Wang YJ(王永军); Wu YX(吴艳霞); Liu XH(刘晓红); Chen JM(陈建敏); Zhou HD(周惠娣); Ye YP(冶银平) Adobe PDF(596Kb)  |  Favorite  |  View/Download:288/1  |  Submit date:2013/07/12 (Ti)/a-c:h Film Magnetron Sputtering Annealing Microstructure Tribological Properties |
| Microstructure, mechanical and tribological properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering 期刊论文 Surface and Coatings Technology, 2011, 卷号: 205, 页码: 3058-3065 Authors: Wang YJ(王永军); Li HX(李红轩); Ji L(吉利); Zhao F(赵飞); Kong QH(孔庆花); Wang YX(王永霞); Liu XH(刘晓红); Quan WL(权伟龙); Zhou HD(周惠娣); Chen JM(陈建敏) Adobe PDF(1807Kb)  |  Favorite  |  View/Download:392/1  |  Submit date:2012/09/24 Unbalanced Magnetron Sputtering Bias Voltage Graphite-like Carbon FIlm Microstructure Tribological Properties |
| Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture 期刊论文 Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581 Authors: Wang YX(王永霞); Ye YP(冶银平); Li HX(李红轩); Ji L(吉利); Wang YJ(王永军); Liu XJ(刘晓军); Chen JM(陈建敏); Zhou HD(周惠娣) Adobe PDF(770Kb)  |  Favorite  |  View/Download:569/3  |  Submit date:2012/09/24 A-c:h FIlm Magnetron Sputtering Microstructure Tribological Property |
| A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文 Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995 Authors: Wang YX(王永霞); Ye YP(冶银平); Li HX(李红轩); Ji L(吉利); Chen JM(陈建敏); Zhou HD(周惠娣) Adobe PDF(1086Kb)  |  Favorite  |  View/Download:328/1  |  Submit date:2012/09/24 A-c:h FIlm Magnetron Sputtering Substrate Bias Microstructure Tribological Property |
| The effect of duty cycle on the microstructure and properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering 期刊论文 Journal of Physics D: Applied Physics, 2010, 卷号: 43, 页码: 505401(1-8) Authors: Wang YJ(王永军); Li HX(李红轩); Ji L(吉利); Zhao F(赵飞); Liu XH(刘晓红); Kong QH(孔庆花); Wang YX(王永霞); Quan WL(权伟龙); Zhou HD(周惠娣); Chen JM(陈建敏) Adobe PDF(1301Kb)  |  Favorite  |  View/Download:254/1  |  Submit date:2012/09/28 |