| Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture | |
| Department | 固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心 |
Wang YX(王永霞); Ye YP(冶银平) ; Li HX(李红轩); Ji L(吉利); Wang YJ(王永军); Liu XJ(刘晓军); Chen JM(陈建敏); Zhou HD(周惠娣)
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| 2011 | |
| Source Publication | Surface and Coatings Technology
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| ISSN | 0257-8972 |
| Volume | 205Pages:4577-4581 |
| Abstract | Hydrogenated amorphous carbon (a-C:H) films were deposited on steel and silicon wafers by unbalanced magnetron sputtering under different CH4/Ar ratios. Microstructure and properties of the a-C:H films were investigated via Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Atomic force microscopy (AFM) and substrate curvaturemethod. The results revealed that CH4/Ar ratio played an important role in the H content but acted a little function on the sp3 /sp2 ratio of the films. Also, the internal stress of those films was relatively low(b1 GPa), and the deposition rate decreased firstly and then increasedwith the decrease of the CH4 fraction. The filmdeposited under CH4/Ar=1/1 (55 sccm/55 sccm)withmoderate sp3 C–H/sp3 C–Chadthebest tribological properties. The composition, microstructure and properties of the a-C:H films were strongly dependent on the deposition process and composition of reactant gases. |
| Keyword | A-c:h FIlm Magnetron Sputtering Microstructure Tribological Property |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/821 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Ye YP(冶银平) |
| Recommended Citation GB/T 7714 | Wang YX,Ye YP,Li HX,et al. Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture[J]. Surface and Coatings Technology,2011,205:4577-4581. |
| APA | 王永霞.,冶银平.,李红轩.,吉利.,王永军.,...&周惠娣.(2011).Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture.Surface and Coatings Technology,205,4577-4581. |
| MLA | 王永霞,et al."Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture".Surface and Coatings Technology 205(2011):4577-4581. |
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| 20114577-4581.PDF（770KB） | 开放获取 | License | View Application Full Text | |||
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