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| Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique 期刊论文 Rare Metal Materials and Engineering, 2012, 卷号: 41, 期号: 增刊:1, 页码: 366-370 Authors: Wang YX(王永霞); Ye YP(冶银平) ; Li HX(李红轩) ; Ji L(吉利) ; Wang YJ(王永军); Wu YX(吴艳霞) ; Liu XH(刘晓红) ; Chen JM(陈建敏) ; Zhou HD(周惠娣) ; Ye YP(冶银平)![](/image/person.jpg)
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| Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture 期刊论文 Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581 Authors: Wang YX(王永霞); Ye YP(冶银平) ; Li HX(李红轩) ; Ji L(吉利) ; Wang YJ(王永军); Liu XJ(刘晓军); Chen JM(陈建敏) ; Zhou HD(周惠娣)![](/image/person.jpg)
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| A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文 Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995 Authors: Wang YX(王永霞); Ye YP(冶银平) ; Li HX(李红轩) ; Ji L(吉利) ; Chen JM(陈建敏) ; Zhou HD(周惠娣)![](/image/person.jpg)
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| 退火温度对 a-C:H 膜结构及摩擦学性能的影响 期刊论文 无机材料学报, 2011, 卷号: 26, 期号: 2, 页码: 209-214 Authors: 王永霞; 冶银平 ; 李红轩 ; 吉利 ; 陈建敏 ; 周惠娣![](/image/person.jpg)
Adobe PDF(941Kb)  |   Favorite  |  View/Download:307/1  |  Submit date:2012/09/24 A-c:h 膜 退火温度 结构 摩擦学性能 A-c:h Film Annealing Temperature Structure Tribological Property |