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中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences
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Source Publication:Journal of Non-Crystalline Solids
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Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity
期刊论文
Journal of Non-Crystalline Solids, 2013, 卷号: 378, 页码: 177-180
Authors:
Wang LQ(王凌倩)
;
Wang, Weiyan
;
Huang, Junjun
;
Zeng, Yuheng
;
Tan, Ruiqin
;
Song, Weijie
;
Chen JM(陈建敏)
;
Chen JM(陈建敏)
Adobe PDF(553Kb)
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View/Download:108/1
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Submit date:2015/10/19
Argon Ion Beam Assisted Magnetron Sputtering
Boron-doped A-si:h Thin Film
Dark Conductivity
Correlation between nitrogen incorporation and structural modification of hydrogenated carbon nitride films
期刊论文
Journal of Non-Crystalline Solids, 2008, 卷号: 354, 页码: 1608-1614
Authors:
Wang CB(王成兵)
;
Yang SR(杨生荣)
;
Zhang JY(张俊彦)
Adobe PDF(390Kb)
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View/Download:285/5
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Submit date:2013/03/28
Diamond-like Carbon
Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system
期刊论文
Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142
Authors:
Hao JY(郝俊英)
;
Liu WM(刘维民)
;
Xue QJ(薛群基)
Adobe PDF(201Kb)
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View/Download:273/2
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Submit date:2013/11/01
Films And Coatings
Chemical Vapor Deposition
Plasma Deposition
Vapor Phase Deposition
Hardness
Indentation
Microindentation
Microstructure
Ftir Measurements
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