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Fabrication of hydrophobic fluorinated amorphous carbon thin films by an electrochemical route 期刊论文
Electrochemistry Communications, 2008, 卷号: 10, 页码: 7-11
Authors:  Chen G(陈刚);  Zhang JY(张俊彦);  Yang SR(杨生荣)
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Fluorinated Amorphous Carbon  Electrochemical Deposition  Afm  Ftir  Hydrophobic Effect  
Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition 期刊论文
Applied Surface Science, 2008, 卷号: 255, 页码: 1836-1840
Authors:  Wang Q(王琦);  Wang CB(王成兵);  Wang Z(王舟);  Zhang JY(张俊彦);  He DY(贺德衍)
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Amorphous Carbon  Stress  Buckling  Dc-pulse Plasma Chemical Vapor Deposition  
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张君英);  Wang LP(王立平);  Zhang JY(张俊彦)
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Al-containing Hydrogenated Amorphous Carbon  Magnetron Sputtering  Applied Substrate Pulse Bias  Hardness  Wear Test