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Electrochemical corrosion behavior of nanocrystalline Co coatings explained by higher grain boundary density 期刊论文
Electrochimica Acta, 2007, 卷号: 52, 页码: 4342-4350
Authors:  Wang LP(王立平);  Lin YM(林义民);  Ceng ZX(曾志翔);  Liu WM(刘维民);  Xue QJ(薛群基);  Hu LT(胡丽天);  Zhang JY(张俊彦)
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Nanocrystalline  Cobalt  Corrosion Behavior  Electrodeposition  Grain Boundary Density  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)  
The structure and tribological behaviors of CrN and Cr–Ti–N coatings 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 7353-7359
Authors:  张广安;  阎鹏勋;  王鹏;  陈友明;  张俊彦
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Magnetron Sputtering  Cr–ti–n Coatings  Structure  Tribological Properties  
Elastic properties of a-C:N:H films 期刊论文
Journal of Applied Physics, 2007, 卷号: 101, 页码: 013501(1-6)
Authors:  Wang CB(王成兵);  Yang SR(杨生荣);  Li HX(李红轩);  Zhang JY(张俊彦)
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A novel method for the synthesis of Au nanoparticles incorporated amorphous hydrogenated carbon films 期刊论文
Electrochemistry Communications, 2007, 卷号: 9, 页码: 1053-1056
Authors:  Chen G(陈刚);  Zhang JY(张俊彦);  Yang SR(杨生荣)
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Carbon Films  Electrochemical Deposition  Metal-doped A-c:h Film  Transmission Electron Microscopy  Microstructure  
Influence of nitrogen content on the structural, electrical and mechanical properties of CrNx thin films 期刊论文
Materials Science and Engineering A, 2007, 卷号: 460-461, 页码: 301-305
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张俊彦)
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Twin Target Medium Frequency Magnetron Sputtering  Crnx Films  Deposition Rate  Structure  Wear Properties  
Fullerene nanostructure-induced excellent mechanical properties in hydrogenated amorphous carbon 期刊论文
APPLIED PHYSICS LETTERS, 2007, 卷号: 91, 页码: 141902(1-3)
Authors:  Wang Q(王琦);  Wang CB(王成兵);  Wang Z(王舟);  Zhang JY(张俊彦);  He DY(贺德衍)
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