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甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:  姜金龙;  陈娣;  王琼;  黄浩;  朱维君;  郝俊英
Adobe PDF(937Kb)  |  Favorite  |  View/Download：118/0  |  Submit date：2016/02/15
A-c:h Films  Middle-frequency Magnetron Sputtering  Mechanical Property  Tribological Property  A-c:H薄膜  中频磁控溅射  力学性能  摩擦性能  
Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering 期刊论文
Advanced Materials Research, 2012, 卷号: 581-582, 页码: 540-543
Authors:  Jiang JL(姜金龙);  Chen D(陈娣);  Zhu WJ(朱伟君);  Jiang JL(姜金龙)
Adobe PDF(1404Kb)  |  Favorite  |  View/Download：325/3  |  Submit date：2013/07/12
Ti-si-c-n Films  Microstructure  Mf Magnetron Sputtering