Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering | |
Department | 固体润滑国家重点实验室 |
Jiang JL(姜金龙); Chen D(陈娣); Zhu WJ(朱伟君); Jiang JL(姜金龙) | |
2012 | |
Source Publication | Advanced Materials Research |
ISSN | 1022-6680 |
Volume | 581-582Pages:540-543 |
Abstract | Quaternary Ti-Si-C-N films were deposited Si wafer by middle frequency magnetron sputtering Ti80Si20 twin-targets in mixture atmosphere of Ar, CH4 and N2. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) results indicate that the films present an amorphous structure with no columnar structure. These films are quite uniform and dense without large particles. The film deposited at 10 sccm CH4 and 10 sccm N2 flow rates exhibits a maximum hardness of 18.9 GPa and high elastic recovery of 97%. |
Keyword | Ti-si-c-n Films Microstructure Mf Magnetron Sputtering |
Subject Area | 材料科学与物理化学 |
Funding Organization | the Natural Science Foundation of China (51105186);the Nature Science Foundation of Gansu Province (1014RJZA007);the Development Program for Outstanding Young Teachers in Lanzhou University of Technology (1010ZCX010) |
Indexed By | EI |
Language | 英语 |
Funding Project | 低维材料摩擦学组 |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/3278 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Jiang JL(姜金龙) |
Recommended Citation GB/T 7714 | Jiang JL,Chen D,Zhu WJ,et al. Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering[J]. Advanced Materials Research,2012,581-582:540-543. |
APA | Jiang JL,Chen D,Zhu WJ,&姜金龙.(2012).Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering.Advanced Materials Research,581-582,540-543. |
MLA | Jiang JL,et al."Synthesis and characterization of quaternary Ti-Si-C-N film deposited by middle frequency magnetron sputtering".Advanced Materials Research 581-582(2012):540-543. |
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540-543.PDF(1404KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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