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Study on the anti-reflection and structure evolution of hydrogenated amorphous carbon grown by plasma chemical vapor deposition 期刊论文
Surface and interface analysis, 2014, 卷号: 46, 期号: 8, 页码: 530-534
Authors:  Shi J(师晶);  Geng ZR(耿中荣);  Zhang JY(张俊彦);  Wang CB(王成兵);  Zhang JY(张俊彦);  Wang CB(王成兵)
Adobe PDF(793Kb)  |  Favorite  |  View/Download：387/7  |  Submit date：2014/10/17
Hydrogenated Amorphous Carbon  Direct Current Plasma-enhanced Chemical Vapor Deposition  Anti-reflection Property  Raman Spectroscopy  X-ray Photoelectron Spectroscopy  
Effects of negative bias on the structural,topological and tribological properties of amorphous carbon films prepared by magnetron sputtering 期刊论文
Surface and Interface Analysis, 2011, 卷号: 43, 页码: 1218-1223
Authors:  Wang Z(王舟);  Wang CB(王成兵);  Zhang B(张斌);  Wang Q(王琦);  Zhang JY(张俊彦)
Adobe PDF(336Kb)  |  Favorite  |  View/Download：305/3  |  Submit date：2012/09/24
Amorphous Carbon FIlms  Magnetron Sputtering  Tribological  
Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition 期刊论文
Applied Surface Science, 2008, 卷号: 255, 页码: 1836-1840
Authors:  Wang Q(王琦);  Wang CB(王成兵);  Wang Z(王舟);  Zhang JY(张俊彦);  He DY(贺德衍)
Adobe PDF(1128Kb)  |  Favorite  |  View/Download：121/2  |  Submit date：2013/03/28
Amorphous Carbon  Stress  Buckling  Dc-pulse Plasma Chemical Vapor Deposition