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The Effects of Precursor C2H2 Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition 期刊论文
Nanomaterials, 2019, 期号: 9, 页码: 528
Authors:  Xiaoqiang Liu(刘小强);  Junying Hao(郝俊英);  Yongjun Lv;  Xuejun Cui
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The plasma nitriding treatment of TiN/TiCN multilayer films 期刊论文
Applied Surface Science, 2013, 卷号: 268, 页码: 195-203
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Gong QY(龚秋雨);  Liu WM(刘维民);  Hao JY(郝俊英)
Adobe PDF(1954Kb)  |  Favorite  |  View/Download:386/5  |  Submit date:2013/12/18
Thick Tin/ticn Multilayer Films  Plasma-nitriding Treatment  Structure And Properties  The Diffusion Of The Amorphous c  
TiN/TiCN multilayer films modified by argon plasma treatment 期刊论文
Applied Surface Science, 2013, 卷号: 280, 页码: 764-771
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Gong QY(龚秋雨);  Liu WM(刘维民);  Hao JY(郝俊英)
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Tin/ticn Multilayer Film  Argon Plasma Treatment  Structure  Mechanical And Tribological Properties  
A thick TiN/TiCN multilayer film by DC magnetron sputtering 期刊论文
Surface & Coatings Technology, 2012, 卷号: 209, 页码: 110-116
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Gong QY(龚秋雨);  Liu WM(刘维民);  Hao JY(郝俊英)
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Tin/ticn Multilayer  Thick Film  Microstructure And Properties  Friction And Wear  
Properties of TiN/TiCN multilayer films by direct current magnetron sputtering 期刊论文
Journal of Physics D: Applied Physics, 2012, 卷号: 45, 期号: 9, 页码: 095303(1-9)
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Liu WM(刘维民);  Hao JY(郝俊英)
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Microstructure, mechanical and tribological properties of Si and Al co-doped hydrogenated amorphous carbon films deposited at various bias voltages 期刊论文
Surface & Coatings Technology, 2012, 卷号: 206, 期号: 19-20, 页码: 4119-4125
Authors:  Liu XQ(刘小强);  Yang J(杨军);  Hao JY(郝俊英);  Zheng JY(郑建云);  Gong QY(龚秋雨);  Liu WM(刘维民);  Hao JY(郝俊英)
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Bias Voltage  Magnetron Sputtering  Surface Morphology  Wear Resistance  Super-low Friction  Amorphous Carbon Film  
Preparation of superior lubricious amorphous carbon films co-doped by silicon and aluminum 期刊论文
Journal of Applied Physics, 2011, 卷号: 110, 页码: 53507(1-8)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang J(杨军);  Zheng JY(郑建云);  Liang YM(梁永民);  Liu WM(刘维民);  Hao JY(郝俊英)
Adobe PDF(1770Kb)  |  Favorite  |  View/Download:481/1  |  Submit date:2013/06/29