| Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols | |
| Department | 先进润滑与防护材料研究发展中心 |
Hai WX(海万秀) ; Ceng JL(曾俊菱); Meng JH(孟军虎); Lv JJ(吕晋军); Meng JH(孟军虎)
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| The second department | 固体润滑国家重点实验室 |
| 2014 | |
| Source Publication | Key Engineering Materials
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| ISSN | 1013-9826 |
| Volume | 602-603Pages:511-514 |
| Abstract | The surface polishing of Ti3SiC2 disk in fluids (water, ethanol, propanol, glycol, and glycerol) is conducted on a Buehler grinder/polisher and evaluated using surface roughness. Using Buehler automatic grinder/polisher, the Ti3SiC2 disks are grinded and polished in the as-mentioned lubricants by grinding disk of diamond with sizes of 45 μm to 3 μm. The surface roughnesses of Ti3SiC2 disks at each stage are measured by 3D surface profiler. The results show that the lowest surface roughness (Ra) of Ti3SiC2 disk obtained by mechanical polishing is 0.04 μm. The optimum polishing process of Ti3SiC2 disk is as follows: using water as lubricant, at a load of 5 N, for steps 1 to 4, the Ti3SiC2 and grinding disk rotates comparatively and the sizes of diamond particles on the abrasive disk are 45, 15, 9, and 3 μm, respectively. For step 5, the abrasive disk is woven cloth with no diamond particles. The duration of each step is 5 min. Using the same polishing process, the surface roughness of Ti3SiC2 disk by direct hot pressing is lower than that by in situ reactive hot pressing. Using the same polishing process but different lubricants, the surface roughness of the Ti3SiC2 disks increases in the order of water, ethanol, propanol, glycol, and glycerol. In water, the surface roughness of Ti3SiC2 disk decreases with the increasing quantity of water and polishing duration. |
| Keyword | Ti3sic2 Alcohols Surface Finishing Surface Roughness |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the “Hundred Talents Program” (Junhu Meng) of Chinese Academy of Sciences;the National Natural Science Foundation of China (51075382) |
| Indexed By | EI |
| Language | 英语 |
| Funding Project | 金属基高温润滑材料组 |
| compositor | 第一作者单位 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/7059 |
| Collection | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Meng JH(孟军虎) |
| Recommended Citation GB/T 7714 | Hai WX,Ceng JL,Meng JH,et al. Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols[J]. Key Engineering Materials,2014,602-603:511-514. |
| APA | Hai WX,Ceng JL,Meng JH,Lv JJ,&孟军虎.(2014).Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols.Key Engineering Materials,602-603,511-514. |
| MLA | Hai WX,et al."Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols".Key Engineering Materials 602-603(2014):511-514. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| KEM.602-603.511.pdf（2980KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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