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The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films
Department固体润滑国家重点实验室
Wang Q(王权)1,2; Hu R(胡然)1; Shao Y(邵银)1; Wang Q(王权)
2012
Source PublicationJournal of Applied Physics
ISSN0021-8979
Volume112Issue:4Pages:044512(1-8)
AbstractFlat, low-stress, boron-doped polysilicon thin films were prepared on crystalline silicon substrates by low pressure chemical vapor deposition. The films’ surface morphologies and internal stresses were investigated using scanning probe microscope and AFM-Raman, respectively. The elastic modulus (E) was measured along with the hardness (H) using the nanoindentation technique. It was found that films deposited at the highest temperature had the largest grain size and surface roughness. The internal stresses in the films are tensile stresses, which are not uniform over the surfaces and present the gradient distribution along the thickness. Both the surface roughness and the internal stresses affect the nanoindentation tests. The tensile stresses in the films give extra forces to the diamond indenter, so the depths of penetration should be larger than those obtained from the films with stress free for a given load, which leads to an underestimation of E as well as H. But under the applied conditions, the increasing surface roughness can not only lead to the reductions of depths of penetration but also cause the measurement values of E and H to be more dispersive and uncertain. So for a given load, if the maximum depth of penetration in the rough surface is smaller than that in the smooth surface, the surface roughness is the main factor affecting the nanoindentation tests. On the contrary, the tensile stress is the main factor.
Subject Area材料科学与物理化学
DOI10.1063/1.4748176
Funding Organizationthe National Science Foundation of China (No. 51175238);the Opening Foundation of Automobile Engineering Key Laboratory of Jiangsu Province, Jiangsu University (No. QC201108);the Opening Foundation of Optical Fabrication Science and Technology Key Laboratory of Jiangsu Province (No. GZ201008)
Indexed BySCI
If2.210
Language英语
compositor第二作者单位
Citation statistics
Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/3347
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorWang Q(王权)
Affiliation1.Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China
2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Wang Q,Hu R,Shao Y,et al. The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films[J]. Journal of Applied Physics,2012,112(4):044512(1-8).
APA Wang Q,Hu R,Shao Y,&王权.(2012).The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films.Journal of Applied Physics,112(4),044512(1-8).
MLA Wang Q,et al."The combined effect of surface roughness and internal stresses on nanoindentation tests of polysilicon thin films".Journal of Applied Physics 112.4(2012):044512(1-8).
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