Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film
Department先进润滑与防护材料研究发展中心
Hu M(胡明)1; Dong Y(董毅)2; Wang Y(王燕)3; Wang DS(王德生)1; Jiang D(姜栋)1; Fu YL(伏彦龙)1; Weng LJ(翁立军)1; Sun JY(孙嘉奕)1; Gao XM(高晓明)1
The second departmentpvd润滑薄膜课题组
2019
Source PublicationCoatings
Issue9Pages:227
If2.330
Language英语
compositor第一作者单位
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/25898
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorWang DS(王德生); Gao XM(高晓明)
Affiliation1.中国科学院兰州化学物理研究所
2.上海宇航系统工程研究所
3.中国空间技术研究院
Corresponding Author AffilicationLanzhou Institute of Chemical Physics,Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Hu M,Dong Y,Wang Y,et al. Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film[J]. Coatings,2019(9):227.
APA Hu M.,Dong Y.,Wang Y.,Wang DS.,Jiang D.,...&Gao XM.(2019).Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film.Coatings(9),227.
MLA Hu M,et al."Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film".Coatings .9(2019):227.
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