Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation | |
Department | OSSO国家重点实验室 |
Chenchen Feng; Lei Wang; Shurong Fu; Kai Fan; Yajun Zhang; Bi YP(毕迎普) | |
2018 | |
Source Publication | J. Mater. Chem. A |
Volume | 6Issue:/Pages:19342 |
If | 9.9 |
Language | 英语 |
compositor | 第一作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/24634 |
Collection | 羰基合成与选择氧化国家重点实验室(OSSO) |
Corresponding Author | Bi YP(毕迎普) |
Recommended Citation GB/T 7714 | Chenchen Feng,Lei Wang,Shurong Fu,et al. Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation[J]. J. Mater. Chem. A,2018,6(/):19342. |
APA | Chenchen Feng,Lei Wang,Shurong Fu,Kai Fan,Yajun Zhang,&Bi YP.(2018).Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation.J. Mater. Chem. A,6(/),19342. |
MLA | Chenchen Feng,et al."Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation".J. Mater. Chem. A 6./(2018):19342. |
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JMCA-Fe2O3-FeF.pdf(942KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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