LICP OpenIR  > 羰基合成与选择氧化国家重点实验室(OSSO)
Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation
DepartmentOSSO国家重点实验室
Chenchen Feng; Lei Wang; Shurong Fu; Kai Fan; Yajun Zhang; Bi YP(毕迎普)
2018
Source PublicationJ. Mater. Chem. A
Volume6Issue:/Pages:19342
If9.9
Language英语
compositor第一作者单位
Citation statistics
Cited Times:7[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/24634
Collection羰基合成与选择氧化国家重点实验室(OSSO)
Corresponding AuthorBi YP(毕迎普)
Recommended Citation
GB/T 7714
Chenchen Feng,Lei Wang,Shurong Fu,et al. Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation[J]. J. Mater. Chem. A,2018,6(/):19342.
APA Chenchen Feng,Lei Wang,Shurong Fu,Kai Fan,Yajun Zhang,&Bi YP.(2018).Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation.J. Mater. Chem. A,6(/),19342.
MLA Chenchen Feng,et al."Ultrathin FeFx nanolayers accelerating hole transfer for enhanced photoelectrochemical water oxidation".J. Mater. Chem. A 6./(2018):19342.
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