LICP OpenIR  > 羰基合成与选择氧化国家重点实验室(OSSO)
Modulation of the excited-electron recombination process by introduce g-C3N4 on Bi-based bimetallic oxides photocatalyst
DepartmentOSSO国家重点实验室
Liu, Duanduan1; Jin ZL(靳治良)1; Li HX(李红轩)2; Lu GX(吕功煊)2; Jin ZL(靳治良)
The second department先进润滑与防护材料研究发展中心
2017
Source PublicationApplied Surface Science
ISSN0169-4332
Volume423Pages:255-265
Abstract

The Bi-based bimetallic oxides photocatalyst Bi7.53CO0.47O11.92 was successfully synthesized and the graphite phase carbon nitride (g-C3N4) was loaded, and a novel composite photocatalyst Bi7.53CO0.47O11.92/g-C3N4 was obtained as well. The photocatalyst Bi7.53CO0.47O11.92, possessed tetragonal crystal structure, with the introduction of g-C3N4, the H2 production reached the maximum about 108 mu mol under continuous visible light irradiation for 4 h, which was 13 times higher than that of pure g-C3N4 photocatalyst. A series of studies shown that the g-C3N4 on the surface of Bi7.53CO0.47O11.92 provided the more active sites and improved the efficiency of photo-generated charge separation by means of several characterizations such as SEM, XRD, XPS, element mapping, UV-vis DRS and FTIR. etc. and the results of which were in good agreement with each other. The composite photocatalyst Bi7.53CO0.47O11.92 has a greater specific surface area and pore volume compared to pure g-C3N4, which is more favorable for the adsorption of dye molecules, leading to enhance the composite photocatalytic activity consequently. The excited-electron recombination process was greatly modulated with the introduce g-C3N4 on the surface of Bi-based bimetallic oxides photocatalyst and the photostability was enhanced as well. The promoted charge separation was measured by means of the EIS, photocurrent and transient fluorescence. In addition, a possible reaction mechanism over eosin Y-sensitized Bi7.53CO0.47O11.92/g-C3N4 photocatalyst under visible light irradiation was proposed.

KeywordPhotocatalyst Bi7.53co0.47o11.92 G-c3n4 H2-production Composite Photocatalyst
Subject Area物理化学与绿色催化
DOI10.1016/j.apsusc.2017.06.156
Funding Organizationthe Chinese National Natural Science Foundation (21433007);the Post-graduated Innovation Research Program of North Minzu University (YCX 1776);the Chinese National Natural Science Foundation (21603274;41663012)
Indexed BySCI
If3.387
Language英语
Funding Project环境催化与氢能研究组;磨损与表面工程研究组
compositor第二作者单位
Citation statistics
Cited Times:58[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/22492
Collection羰基合成与选择氧化国家重点实验室(OSSO)
中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorJin ZL(靳治良)
Affiliation1.North Minzu Univ, Sch Chem & Chem Engn, Yinchuan 750021, Peoples R China
2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Oxo Synth & Select Oxidat, Lanzhou 730000, Gansu, Peoples R China
Recommended Citation
GB/T 7714
Liu, Duanduan,Jin ZL,Li HX,et al. Modulation of the excited-electron recombination process by introduce g-C3N4 on Bi-based bimetallic oxides photocatalyst[J]. Applied Surface Science,2017,423:255-265.
APA Liu, Duanduan,Jin ZL,Li HX,Lu GX,&靳治良.(2017).Modulation of the excited-electron recombination process by introduce g-C3N4 on Bi-based bimetallic oxides photocatalyst.Applied Surface Science,423,255-265.
MLA Liu, Duanduan,et al."Modulation of the excited-electron recombination process by introduce g-C3N4 on Bi-based bimetallic oxides photocatalyst".Applied Surface Science 423(2017):255-265.
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