Reaction system and process for preparing polymethoxy dimethyl ether | |
Chen J(陈静); Song HY(宋河远); Xia CG(夏春谷); Kang MR(康美荣) | |
2015-10-27 | |
Rights Holder | Suzhou OST Advanced Materials Co., Ltd ; Lanzhou Institute of Chemical Physics, Chinese Academy of Science |
Country | 美国 |
Abstract | The invention relates to a reaction system and process for continuously preparing polymethoxy dimethyl ether (DMM3-8) by a continuous acetalization reaction between an aqueous formaldehyde solution or paraformaldehyde and methanol in the presence of a functionalized acidic ionic liquid as a catalyst. The reaction system of the invention preferably comprises a formaldehyde-concentrating unit, a vacuum-drying unit, an acetalization reaction unit, a product-separating unit and a catalyst-regenerating unit. The process of the invention uses aqueous formaldehyde solution as an initial raw material, which is concentrated in the formaldehyde-concentrating unit to a concentrated formaldehyde of 50.about.80 wt. %, and vacuum-dried to paraformaldehyde, or uses paraformaldehyde as raw material directly, then obtains DMM3-8 by an acetalization reaction. The raw materials of the reaction used in the invention are cheap and available easily, and the utilization rate of formaldehyde is high; an efficient separation between the catalyst and product, as well as the reuse of the catalyst and raw materials, are realized by a separation mode of combining extraction and rectification together. |
Subject Area | 物理化学与绿色催化 |
Department | OSSO国家重点实验室 |
Application Date | 2013-09-29 |
Patent Number | US 9168503 B2 |
Language | 英语 |
Status | 授权 |
Document Type | 专利 |
Identifier | http://ir.licp.cn/handle/362003/19096 |
Collection | 羰基合成与选择氧化国家重点实验室(OSSO) |
Affiliation | Lanzhou Institute of Chemical Physics, Chinese Academy of Science |
Recommended Citation GB/T 7714 | Chen J,Song HY,Xia CG,et al. Reaction system and process for preparing polymethoxy dimethyl ether. US 9168503 B2[P]. 2015-10-27. |
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US-9168503专利证书.pdf(1861KB) | 专利 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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