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Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering 期刊论文
Diamond and Related Materials, 2010, 卷号: 19, 页码: 1172-1177
Authors:  姜金龙;  郝俊英;  逄显娟;  王鹏;  刘维民
Adobe PDF(1497Kb)  |  Favorite  |  View/Download：210/1  |  Submit date：2012/09/28
Amorphous Hydrogenated Carbon  Doping  Microstructure  Superlow Friction  
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张君英);  Wang LP(王立平);  Zhang JY(张俊彦)
Adobe PDF(1278Kb)  |  Favorite  |  View/Download：128/2  |  Submit date：2013/03/28
Al-containing Hydrogenated Amorphous Carbon  Magnetron Sputtering  Applied Substrate Pulse Bias  Hardness  Wear Test  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
Adobe PDF(688Kb)  |  Favorite  |  View/Download：152/3  |  Submit date：2013/11/01
Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)