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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering 期刊论文
Materials Science and Engineering B, 2011, 卷号: 176, 页码: 850-854
Authors:  Gong QH(巩清华);  Ji L(吉利);  Li HX(李红轩);  Liu XH(刘晓红);  Wang YJ(王永军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(519Kb)  |  Favorite  |  View/Download：294/3  |  Submit date：2012/09/24
Crn FIlms  Medium Frequency Magnetron Sputterin  Substrate Bias Voltage  Microstructure  Residual Stress  
A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文
Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(1086Kb)  |  Favorite  |  View/Download：324/1  |  Submit date：2012/09/24
A-c:h FIlm  Magnetron Sputtering  Substrate Bias  Microstructure  Tribological Property  
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张君英);  Wang LP(王立平);  Zhang JY(张俊彦)
Adobe PDF(1278Kb)  |  Favorite  |  View/Download：129/2  |  Submit date：2013/03/28
Al-containing Hydrogenated Amorphous Carbon  Magnetron Sputtering  Applied Substrate Pulse Bias  Hardness  Wear Test