×
验证码:
换一张
Forgotten Password?
Stay signed in
×
Log In
Chinese
|
English
中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences
Log In
Register
ALL
ORCID
Title
Creator
Subject Area
Keyword
Document Type
Source Publication
Indexed By
Publisher
Date Issued
Date Accessioned
Funding Project
MOST Discipline Catalogue
Study Hall
Image search
Paste the image URL
Home
Collections
Authors
DocType
Subjects
K-Map
News
Search in the results
Collection
固体润滑国家重点实验... [2]
中国科学院材料磨损与... [2]
Source Publication
Applied Su... [1]
Materials ... [1]
Funding Project
PVD润滑薄膜研究组 [2]
空间润滑材料研究组 [1]
Funding Organization
China Nati... [2]
51227804) [1]
51505465 [1]
51575509 [1]
51575509) [1]
Creator
刘维民 [2]
孙嘉奕 [2]
翁立军 [2]
胡明 [2]
高晓明 [2]
Anne Nevil... [1]
More...
Language
英语 [2]
Document Type
Journal ar... [2]
Date Issued
2018 [2]
Indexed By
SCI [2]
End Date
Corresponding Author
×
Knowledge Map
LICP OpenIR
Start a Submission
Submissions
Unclaimed
Claimed
Attach Fulltext
Bookmarks
QQ
Weibo
Feedback
Browse/Search Results:
1-2 of 2
Help
Filters
Language:英语
Funding Organization:China National Natural Science Foundation (Grant No. 51575508
Selected(
0
)
Clear
Items/Page:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort:
Select
Issue Date Ascending
Issue Date Descending
Submit date Ascending
Submit date Descending
Author Ascending
Author Descending
Journal Impact Factor Ascending
Journal Impact Factor Descending
Title Ascending
Title Descending
WOS Cited Times Ascending
WOS Cited Times Descending
In-situ friction and wear responses of WS2 films to space environment: Vacuum and atomic oxygen
期刊论文
Applied Surface Science, 2018, 卷号: 447, 期号: 0, 页码: 368-373
Authors:
Xu SS(徐书生)
;
Sun JY(孙嘉奕)
;
Weng LJ(翁立军)
;
Yong Hua
;
Liu WM(刘维民)
;
Anne Neville
;
Hu M(胡明)
;
Gao XM(高晓明)
;
Gao XM(高晓明)
;
Hu M(胡明)
Adobe PDF(2564Kb)
  |  
Favorite
  |  
View/Download:299/7
  |  
Submit date:2018/04/07
In-situ
Atomic Oxygen
Ws2 Films
Friction
Wear
MoS2-Sb2O3 film exhibiting better oxidation-resistance in atomic oxygen environment
期刊论文
Materials Letters, 2018, 卷号: 219, 期号: 0, 页码: 212-215
Authors:
Gao XM(高晓明)
;
Hu M(胡明)
;
Fu YL(伏彦龙)
;
Wang DS(王德生)
;
Jiang D(姜栋)
;
Weng LJ(翁立军)
;
Liu WM(刘维民)
;
Sun JY(孙嘉奕)
;
Sun JY(孙嘉奕)
Adobe PDF(995Kb)
  |  
Favorite
  |  
View/Download:139/4
  |  
Submit date:2018/03/11
Physical Vapour Deposition
Thin Films
Structural
Atomic Oxygen
Oxidation