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Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C: H Films Prepared through Magnetron Sputtering Deposition 期刊论文
Journal of Nanomaterials, 2015, 页码: 194308(1-9)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang, Hu;  Lin, Xiuzhou;  Zeng, Xianguang
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Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system 期刊论文
Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142
Authors:  Hao JY(郝俊英);  Liu WM(刘维民);  Xue QJ(薛群基)
Adobe PDF(201Kb)  |  Favorite  |  View/Download：271/2  |  Submit date：2013/11/01
Films And Coatings  Chemical Vapor Deposition  Plasma Deposition  Vapor Phase Deposition  Hardness  Indentation  Microindentation  Microstructure  Ftir Measurements  Xps  
Novel Single-Source Precursors Approach to Prepare Highly Uniform Bi2S3 and Sb2S3 Nanorods via a Solvothermal Treatment 期刊论文
Chem. Mater., 2007, 卷号: 19, 页码: 872-878
Authors:  Lou WJ(娄文静);  Chen M(陈淼);  Wang XB(王晓波);  Liu WM(刘维民)
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