Chinese | English

Search in the results

LICP OpenIR

Browse/Search Results:  1-6 of 6 Help

Filters            
Selected(0)Clear Items/Page:    Sort:
Nanostructured TiN-based thin films by a novel and facile synthetic route 期刊论文
Materials and Design, 2017, 卷号: 113, 页码: 142-148
Authors:  Zheng JY(郑建云);  Lv, Yanhong;  Xu SS(徐书生);  Han, Xi;  Zhang, Shuaituo;  Hao JY(郝俊英);  Liu WM(刘维民);  Zheng JY(郑建云);  Hao JY(郝俊英)
Adobe PDF(1333Kb)  |  Favorite  |  View/Download：237/3  |  Submit date：2017/02/16
Nanostructured Thin Films  Tin-based  High Specific Area  Transparent And Hydrophobic  Flexible And Superhard  
Carbon nanohoops as attractive toughening and lubricant agents in TiN porous films 期刊论文
Applied Surface Science, 2017, 卷号: 393, 页码: 60-66
Authors:  Zheng JY(郑建云);  Ren, Xiaodong;  Hao JY(郝俊英);  Li, Ang;  Liu WM(刘维民);  Zheng JY(郑建云);  Hao JY(郝俊英)
Adobe PDF(2548Kb)  |  Favorite  |  View/Download：159/1  |  Submit date：2017/02/16
Carbon Nanohoops  Tin Porous Films  Ch4 Plasma Treatment  Modifying Properties  
The plasma nitriding treatment of TiN/TiCN multilayer films 期刊论文
Applied Surface Science, 2013, 卷号: 268, 页码: 195-203
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Gong QY(龚秋雨);  Liu WM(刘维民);  Hao JY(郝俊英)
Adobe PDF(1954Kb)  |  Favorite  |  View/Download：386/5  |  Submit date：2013/12/18
Thick Tin/ticn Multilayer Films  Plasma-nitriding Treatment  Structure And Properties  The Diffusion Of The Amorphous c  
Properties of TiN/TiCN multilayer films by direct current magnetron sputtering 期刊论文
Journal of Physics D: Applied Physics, 2012, 卷号: 45, 期号: 9, 页码: 095303(1-9)
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Liu WM(刘维民);  Hao JY(郝俊英)
Adobe PDF(1327Kb)  |  Favorite  |  View/Download：301/5  |  Submit date：2013/07/12
Effect of deposition pressure on the adhesion and tribological properties of a-CNxH films prepared by DC-RF-PECVD 期刊论文
Journal of Materials Science, 2008, 卷号: 43, 页码: 645-651
Authors:  Ding J(丁军);  Hao JY(郝俊英);  Xue QJ(薛群基);  Liu WM(刘维民)
Adobe PDF(518Kb)  |  Favorite  |  View/Download：240/0  |  Submit date：2013/03/28
Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system 期刊论文
Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142
Authors:  Hao JY(郝俊英);  Liu WM(刘维民);  Xue QJ(薛群基)
Adobe PDF(201Kb)  |  Favorite  |  View/Download：272/2  |  Submit date：2013/11/01
Films And Coatings  Chemical Vapor Deposition  Plasma Deposition  Vapor Phase Deposition  Hardness  Indentation  Microindentation  Microstructure  Ftir Measurements  Xps