×
验证码:
换一张
Forgotten Password?
Stay signed in
×
Log In
Chinese
|
English
中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences
Log In
Register
ALL
ORCID
Title
Creator
Subject Area
Keyword
Document Type
Source Publication
Indexed By
Publisher
Date Issued
Date Accessioned
Funding Project
MOST Discipline Catalogue
Study Hall
Image search
Paste the image URL
Home
Collections
Authors
DocType
Subjects
K-Map
News
Search in the results
Collection
固体润滑国家重点实验... [1]
Source Publication
稀有金属材料与工程 [1]
Funding Project
空间润滑材料组 [1]
Funding Organization
National N... [1]
Creator
姜金龙 [1]
朱维君 [1]
王琼 [1]
郝俊英 [1]
陈娣 [1]
黄浩 [1]
More...
Language
英语 [1]
Document Type
Journal ar... [1]
Date Issued
2014 [1]
Indexed By
SCI&CSCD [1]
End Date
Corresponding Author
×
Knowledge Map
LICP OpenIR
Start a Submission
Submissions
Unclaimed
Claimed
Attach Fulltext
Bookmarks
QQ
Weibo
Feedback
Browse/Search Results:
1-1 of 1
Help
Filters
Indexed By:SCI\&CSCD
Source Publication:稀有金属材料与工程
Creator:zhuweijun分朱维君
Creator:姜金龙
First author
Community:固体润滑国家重点实验室(LSL)
First author affiliation
The first author
Corresponding Author
Selected(
0
)
Clear
Items/Page:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort:
Select
Issue Date Ascending
Issue Date Descending
Journal Impact Factor Ascending
Journal Impact Factor Descending
Title Ascending
Title Descending
Submit date Ascending
Submit date Descending
Author Ascending
Author Descending
WOS Cited Times Ascending
WOS Cited Times Descending
甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文)
期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:
姜金龙
;
陈娣
;
王琼
;
黄浩
;
朱维君
;
郝俊英
Adobe PDF(937Kb)
  |  
Favorite
  |  
View/Download:126/0
  |  
Submit date:2016/02/15
A-c:h Films
Middle-frequency Magnetron Sputtering
Mechanical Property
Tribological Property
A-c:H薄膜
中频磁控溅射
力学性能
摩擦性能