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Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure
Department固体润滑国家重点实验室
Wan SH(万善宏); Wang LP(王立平); Xue QJ(薛群基)
2010
Source PublicationElectrochemistry Communications
ISSN1388-2481
Volume12Pages:61-65
AbstractSulfur doped DLC nanocomposite film was fabricated on n-type silicon substrates by the electrochemicamethod using the mixture of methanol and thiofuran as the precursor. The synthesis and microstructureof the composite film was investigated. Compared with pure carbon film, sulfur doping effectivelyenhanced carbon film graphitization, and reduced the surface roughness, confirmed by XPS, Ramanand AFM. In particular, XPS analysis revealed sulfur atoms among amorphous carbon matrix was inthe form of organosulfur compounds. Furthermore, a novel but feasible growth mechanism was proposedfollowing the synergism of thermochemistry, plasma chemistry and electrochemistry processes.
KeywordDiamond-like Carbon Sulfur Plasma Chemistry
Subject Area材料科学与物理化学
Funding Organizationthe National Natural Science Foundation of China (Grant Nos. 50772115, 50823008.);the 863 program of Chinese Ministry of Science and Technology (No. 2009AA03Z105)
Indexed BySCI
Language英语
Funding Project低维材料摩擦学组
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/989
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorWang LP(王立平); Xue QJ(薛群基)
Recommended Citation
GB/T 7714
Wan SH,Wang LP,Xue QJ. Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure[J]. Electrochemistry Communications,2010,12:61-65.
APA 万善宏,王立平,&薛群基.(2010).Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure.Electrochemistry Communications,12,61-65.
MLA 万善宏,et al."Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure".Electrochemistry Communications 12(2010):61-65.
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