| Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD | |
| Department | 固体润滑国家重点实验室 |
Hao JY(郝俊英) ; Xu T(徐洮); Liu WM(刘维民); Liu WM(刘维民)
| |
| 2005 | |
| Source Publication | Journal of Non-Crystalline Solids
 |
| ISSN | 0022-3093 |
| Volume | 351Pages:3671-3676 |
| Abstract | Hydrogenated carbon nitride (a-CN:H films) were deposited on n-type (1 0 0) silicon substrates making use of dual direct current radio frequency plasma enhanced chemical vapor deposition (DC-RF-PECVD),at working pressure of 2–20 Pa, using a mixed gas of CH4 and N2 as the source gas. The growth rate, composition, bonding structure of the deposited films were characterized by means of XPS and FTIR, and the mechanical properties of the deposited films were investigated by nano-indentation test. It was found that the parameters for the DC-RF-PECVD process had significant effects on the growth rate, structure and properties of the deposited films. The growth rate of the deposited films increased at first with increasing deposition pressure, then saturated with further increase of the deposition pressure. The N/C ratio inside the deposited films increased with increasing working pressure except that it was as much as 0.50 at a working pressure of 5.0 Pa. The nano-hardness of the films decreased with increasing deposition pressure. CN radicals were remarkably formed in the deposited films at higher pressures, and their contents are related to the nitrogen concentrations in the deposited films. |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant Nos. 50405040;50323007);“863” program of China (Grant No. 2003AA305670);the Innovative Group Foundation from NSFC (Grant No. 50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 空间润滑材料组;先进固体润滑膜组 |
| compositor | 第一作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/7043 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Liu WM(刘维民) |
| Recommended Citation GB/T 7714 | Hao JY,Xu T,Liu WM,et al. Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD[J]. Journal of Non-Crystalline Solids,2005,351:3671-3676. |
| APA | Hao JY,Xu T,Liu WM,&刘维民.(2005).Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD.Journal of Non-Crystalline Solids,351,3671-3676. |
| MLA | Hao JY,et al."Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD".Journal of Non-Crystalline Solids 351(2005):3671-3676. |
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| 3-2005-Effect of dep（173KB） | 开放获取 | CC BY-NC-SA | View Application Full Text | |||
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