Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasms system | |
Department | 固体润滑国家重点实验室 |
Hao JY(郝俊英)![]() ![]() ![]() | |
2005 | |
Source Publication | Materials and Science Engineering A
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ISSN | 0921-5093 |
Volume | 408Pages:297-302 |
Abstract | Carbon nitride films (CNx films) were deposited on Si(1 0 0) substrates making use of dual direct current radio frequency (DC-RF) plasma enhanced chemical vapor deposition (PECVD), using a mixed gas of CH4 and N2 as the source gas. The microstructures, morphologies, and compositions of the resulting CNx films were analyzed by means of atomic force microscopy (AFM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), Fourier transformation infrared spectrometry (FTIR), and Raman spectroscopy. The mechanical properties of the CNx films were examined using a nano-indentation test system. The Raman spectrum showed two characteristic bands: a graphite G band and a disordered D band of carbon, which suggested the presence of an amorphous carbon matrix. FTIR and XPS measurements suggested the existence of C-NH, C=NH, C≡N, N-H, and C-H in the CNx films, and the nitrogen to carbon atom ratio (N/C) is as much as 0.50. Moreover, the TEM showed various diffraction rings of different d values, which could confirm the polycrystallites embedded in the CNx matrix. Besides, the quality and elasticity of the CNx films were significantly improved by the incorporation of nitrogen. The films prepared in the present work had much higher hardness and Young’s modulus than the DLC films prepared under the same conditions, and the elastic recovery parameter was up to 89%. |
Keyword | Carbon Nitride Films Pecvd Composition Mechanical Properties |
Subject Area | 材料科学与物理化学 |
Funding Organization | the National Natural Science Foundation of China (Grant No. 50405040;No. 50323007);“863” program of China (Grant No. 2003AA305670);the Innovative Group Foundation from NSFC(Grant No. 50421502) |
Indexed By | SCI |
Language | 英语 |
Funding Project | 空间润滑材料组;先进固体润滑膜组 |
compositor | 第一作者单位 |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/7042 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Liu WM(刘维民) |
Recommended Citation GB/T 7714 | Hao JY,Xu T,Liu WM,et al. Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasms system[J]. Materials and Science Engineering A,2005,408:297-302. |
APA | Hao JY,Xu T,Liu WM,&刘维民.(2005).Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasms system.Materials and Science Engineering A,408,297-302. |
MLA | Hao JY,et al."Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasms system".Materials and Science Engineering A 408(2005):297-302. |
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