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Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering
Department固体润滑国家重点实验室
Jiang JL(姜金龙)1,2; Wang Q(王琼)1; Wang YB(王玉宝)1; Zhang X(张霞)1; Yang H(杨华)1; Hao JY(郝俊英)2; Jiang JL(姜金龙)
2014
Source PublicationJournal of Nanomaterials
ISSN1687-4110
Pages937068-7
AbstractThe titanium- and silicon-codoped a-C:H films were prepared at different applied bias voltage by magnetron sputtering TiSi target in argon and methane mixture atmosphere. The influence of the applied bias voltage on the composition, surface morphology, structure, and mechanical properties of the films was investigated by XPS, AFM, Raman, FTIR spectroscopy, and nanoindenter. The tribological properties of the films were characterized on an UMT-2MT tribometer. The results demonstrated that the film became smoother and denser with increasing the applied bias voltage up to −200V, whereas surface roughness increased due to the enhancement of ion bombardment as the applied bias voltage further increased. The sp3 carbon fraction in the filmsmonotonously decreased with increasing the applied bias voltage.The film exhibited moderate hardness and the superior tribological properties at the applied bias voltage of −100V.The tribological behaviors are correlated to the H/E or H3/E2 ratio of the films.
Subject Area材料科学与物理化学
DOI10.1155/2014/937068
Funding Organizationthe Natural Science Foundation of China (51105186);the Excellent Young Teachers Program of Lanzhou University of Technology (1010ZCX010);the Doctoral Research grant of Lanzhou University of Technology
Indexed BySCI
If1.644
Language英语
Funding Project空间润滑材料组
compositor第二作者单位
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/6992
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorJiang JL(姜金龙)
Affiliation1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China
2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Jiang JL,Wang Q,Wang YB,et al. Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering[J]. Journal of Nanomaterials,2014:937068-7.
APA Jiang JL.,Wang Q.,Wang YB.,Zhang X.,Yang H.,...&姜金龙.(2014).Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering.Journal of Nanomaterials,937068-7.
MLA Jiang JL,et al."Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering".Journal of Nanomaterials (2014):937068-7.
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