| Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O2 | |
| Department | 固体润滑国家重点实验室 |
| Li C(李春); Li XC(李晓春); Yan PX(阎鹏勋); Chong EM(崇二敏); Liu Y(刘洋); Yue GH(岳光辉); Fan XY(范晓彦) | |
| 2007 | |
| Source Publication | Applied Surface Science
 |
| ISSN | 0169-4332 |
| Volume | 253Pages:4000-4005 |
| Abstract | ZnO thin film has been deposited on the glass substrate at a temperature of 200 8C using the filtered cathodic arc plasma (FCAP) technique with the oxygen flow rate of 1.0, 3.0, 5.0, 7.0, 9.0 and 10.0 sccm. The deposition processes are only held in pure oxygen atmosphere. The as-grown films exhibit a polycrystalline hexagonal wurtzite structure. With the oxygen flow rate increase, the crystallinity of the samples first increases and then decreases as measured by X-ray diffractometry (XRD). And the tensile stress exists in all the as-grown thin films. The small grain with a mean diameter of 13 nm is observed by the field emission scanning electron microscopy (FESEM). The electrical resistivity values of the thin films are very low ranging from 5.42 10 3 V cm to 4.0 10 2 V cm. According to the result from room temperature photoluminescence spectra measurement, the luminescent bands also depend on the oxygen supply. |
| Keyword | Zno Thin Films Filtered Cathodic Arc Plasma Tensile Stress Electrical Resistivity Photoluminescence |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | National Natural Science Foundation of China (Grant no. 60376039) |
| Indexed By | SCI |
| Language | 英语 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/4100 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Yan PX(阎鹏勋) |
| Recommended Citation GB/T 7714 | Li C,Li XC,Yan PX,et al. Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O2[J]. Applied Surface Science,2007,253:4000-4005. |
| APA | 李春.,李晓春.,阎鹏勋.,崇二敏.,刘洋.,...&范晓彦.(2007).Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O2.Applied Surface Science,253,4000-4005. |
| MLA | 李春,et al."Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O2".Applied Surface Science 253(2007):4000-4005. |
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| File Name/Size | DocType | Version | Access | License | ||
| 20074000-4005.pdf（578KB） | 开放获取 | CC BY-NC-SA | View Application Full Text | |||
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