Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing
Department先进润滑与防护材料研究发展中心
Wang C(王超); Wang TM(王廷梅); Wang QH(王齐华)
The second department聚合物自润滑复合材料
2019-01
Source PublicationJournal of Polymer Research
Volume26Issue:1Pages:5
Indexed BySCI
If1.53
Language英语
compositor第一作者单位
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/26141
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorWang C(王超)
AffiliationState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, People’s Republic of China
Recommended Citation
GB/T 7714
Wang C,Wang TM,Wang QH. Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing[J]. Journal of Polymer Research,2019,26(1):5.
APA Wang C,Wang TM,&Wang QH.(2019).Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing.Journal of Polymer Research,26(1),5.
MLA Wang C,et al."Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing".Journal of Polymer Research 26.1(2019):5.
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