| The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition | |
| Department | 固体润滑国家重点实验室 |
Wang Q(王琦); Wang CB(王成兵); Wang Z(王舟); Zhang JY(张俊彦) ; He DY(贺德衍)
| |
| 2008 | |
| Source Publication | Applied Physics Letters
 |
| ISSN | 0003-6951 |
| Volume | 93Pages:131920(1-3) |
| Abstract | Hydrogenated diamondlike carbon films were prepared at different reactive times by dc-pulse plasma chemical vapor deposition technique. The thickness of the film increased significantly with the reactive time, and the stress is just 0.9 GPa when the thickness of the film increased to 2 m. The structure analysis by high resolution transmission electron microscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, and Fourier transform infrared spectra revealed a close relationship between the residual compressive stress and the microstructure of the films, which nanometer scale curved graphite sheets with pentatomic and heptatomic rings bestowed the film lower stress. |
| Subject Area | 材料科学与物理化学 |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 纳米润滑研究组 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/2569 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Zhang JY(张俊彦); He DY(贺德衍) |
| Recommended Citation GB/T 7714 | Wang Q,Wang CB,Wang Z,et al. The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition[J]. Applied Physics Letters,2008,93:131920(1-3). |
| APA | 王琦,王成兵,王舟,张俊彦,&贺德衍.(2008).The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition.Applied Physics Letters,93,131920(1-3). |
| MLA | 王琦,et al."The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition".Applied Physics Letters 93(2008):131920(1-3). |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2008131920.PDF（339KB） | 开放获取 | License | View Application Full Text | |||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment