| Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique, | |
| Department | 固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心 |
Zhao F(赵飞); Li HX(李红轩) ; Ji L(吉利); Mo YF(莫宇飞); Quan WL(权伟龙); Zhou HD(周惠娣); Chen JM(陈建敏)
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| 2009 | |
| Source Publication | Journal of Physics D: Applied Physics
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| ISSN | 0022-3727 |
| Volume | 42Pages:165407(1-13) |
| Abstract | a-C:H:Si films were prepared under different CH4/Ar ratios by a hybrid radio frequency plasma-enhanced chemical vapour deposition (RFPECVD) and unbalanced magnetron sputtering technique. Characterizations showed that the CH4/Ar ratio affected not only the content but also the chemical state of the doped Si, thus further affecting the microstructures,mechanical and tribological performances of the a-C:H:Si films. Generally, when the CH4/Ar ratio was low ( 4/2), the Si-doping content dropped with increased CH4 percentage,accompanied by a decreased sp3 (C–Si+C–C)/sp2(C=C), increased ID/IG ratio and up-shift of the G peak position, as can be seen from the Raman spectra, while at a higher CH4 percentage(e.g. CH4/Ar = 5/2), the prepared a-C:H:Si films exhibited a series of aberrant properties due to the incorporation of abundant H and the high oxidization of the doped Si. Anotherunique characteristic of our films was the presence of numerous Si–Si bonds at high Sicontent, which was not observed in the a-C:H:Si films produced by the decomposition of Si-containing gaseous precursors. Moreover, although Si incorporation improved suchproperties of the DLC films as adhesion strength, internal stress and tribological moisturesensitivity, its effectiveness in enhancing the mechanical and tribological performances were governed not by the Si-doping content or sp3-C fraction but by the film continuity or adhesion (minimized interlinking destruction by the Si–H, C–H, Si–O–Si bonds) and sp2 (C=C) fraction (based on the film continuity). |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant Nos 50705093;50575217);the Innovative Group Foundation from NSFC (Grant No 50421502);the National 973 Project (No 2007CB607601) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损与表面工程组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/2083 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Chen JM(陈建敏) |
| Recommended Citation GB/T 7714 | Zhao F,Li HX,Ji L,et al. Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,[J]. Journal of Physics D: Applied Physics,2009,42:165407(1-13). |
| APA | 赵飞.,李红轩.,吉利.,莫宇飞.,权伟龙.,...&陈建敏.(2009).Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,.Journal of Physics D: Applied Physics,42,165407(1-13). |
| MLA | 赵飞,et al."Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,".Journal of Physics D: Applied Physics 42(2009):165407(1-13). |
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