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Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc
Department固体润滑国家重点实验室
Pang XJ(逄显娟)1,2,3; Liu XQ(刘小强)2; Jin, Bo2
2014
Source PublicationJournal of Nanomaterials
ISSN1687-4110
Pages286484(1-7)
AbstractNanocomposite Ti-Al-C films were deposited by filtered cathodic vacuum arc (FCVA) at different CH4 flows. The deposited films were characterized in terms of elemental and phase compositions, chemical bonds, and texture as a function of CH4 flow rate by XRD, XPS, HRTEM, Raman spectroscopy, and IR spectroscopy. The results show that the TiC grain size decreases from 4.2 to 2.9 nm as the CH4 flow rate increases from 30 to 80 sccm. The analysis of XPS, HRTEM, and Raman spectroscopy shows that the microstructure of deposited films turns from a TiC dominant TiC-C film to a carbon network dominant TiAl-doped a-C film structure as the CH4 flow increases from 30 sccm to 80 sccm. IR spectroscopy shows that most of the hydrogen atoms in the deposited films are bonded to the sp3-hybridized C atoms. All the composition and microstructure change can be explained by considering the plasma conditions and the effect of CH4 flow.
Subject Area材料科学与物理化学
DOI10.1155/2014/286484
Funding Organizationthe Natural Science Foundation of China (Grant no. 50902133);the Project of the Education Department of Henan Province (14A430009);the Open Fund of State Key Laboratory of Solid Lubrication (1201);the Fund of Henan University of Science and Technology (2013QN001)
Indexed BySCI
If1.644
Language英语
compositor第二作者单位
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/20334
Collection固体润滑国家重点实验室(LSL)
Affiliation1.Henan Univ Sci & Technol, Sch Chem Engn & Pharmaceut, Luoyang 471023, Peoples R China
2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
3.Henan Key Lab Mat Tribol, Luoyang 471003, Peoples R China
Recommended Citation
GB/T 7714
Pang XJ,Liu XQ,Jin, Bo. Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc[J]. Journal of Nanomaterials,2014:286484(1-7).
APA Pang XJ,Liu XQ,&Jin, Bo.(2014).Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc.Journal of Nanomaterials,286484(1-7).
MLA Pang XJ,et al."Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc".Journal of Nanomaterials (2014):286484(1-7).
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