Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles | |
Department | 固体润滑国家重点实验室 |
Jiang JL(姜金龙)1; Wang YB(王玉宝)1; Wang Q(王琼)1; Huang H(黄浩)1; Wei ZQ(魏智强)1; Hao JY(郝俊英)2 | |
2016 | |
Source Publication | Chinese Physics B |
ISSN | 1674-1056 |
Volume | 25Issue:4Pages:048101(1-6) |
Abstract | The a-C and a-C:H films are deposited on silicon surfaces modified with and without nickel nanoparticles by using mid-frequency magnetron sputtering. The microstructures and morphologies of the films are analyzed by Raman spectroscopy and atomic force microscopy. Field emission behaviors of the deposited films with and without nickel nanoparticles modification are comparatively investigated. It is found that the hydrogen-free carbon film exhibits a high field emission current density and low turn-on electric field compared with the hydrogenated carbon film. Nickel modifying could increase the current density, whereas it has no significant effect on the turn-on electric field. The mechanism of field electron emission of a sample is discussed from the surface morphologies of the films and nickel nanoparticle roles in the interface between film and substrate. |
Keyword | Dlc Films Field Emission Magnetron Sputtering Nickel Nanoparticles Modification |
Subject Area | 材料科学与物理化学 |
DOI | 10.1088/1674-1056/25/4/048101 |
Funding Organization | the National Natural Science Foundation of China (Grant No. 51105186) |
Indexed By | SCI |
If | 1.223 |
Language | 英语 |
Funding Project | 空间润滑材料组 |
compositor | 第二作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/20088 |
Collection | 固体润滑国家重点实验室(LSL) |
Affiliation | 1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
Recommended Citation GB/T 7714 | Jiang JL,Wang YB,Wang Q,et al. Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles[J]. Chinese Physics B,2016,25(4):048101(1-6). |
APA | Jiang JL,Wang YB,Wang Q,Huang H,Wei ZQ,&Hao JY.(2016).Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles.Chinese Physics B,25(4),048101(1-6). |
MLA | Jiang JL,et al."Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles".Chinese Physics B 25.4(2016):048101(1-6). |
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cpb_25_4_048101.pdf(1079KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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