LICP OpenIR  > 固体润滑国家重点实验室(LSL)
Field emission properties of DLC and phosphorus-doped DLC films prepared by electrochemical deposition process
Department固体润滑国家重点实验室
Wan SH(万善宏); Wang LP(王立平); Zhang JY(张俊彦); Xue QJ(薛群基)
2009
Source PublicationApplied Surface Science
ISSN0169-4332
Volume255Pages:3817-3821
AbstractField emission behavior of diamond-like carbon (DLC) and phosphorus-doped DLC (p-DLC) films prepared by electrochemical deposition process was comparatively investigated. It was shown phosphorus incorporation in the DLC film could lower the turn on field from 12 to 9.5 V/mm and increase the current density from12.6 to 45.7 mA/mm2 under high electric field. And better field emission performance of p-DLC films would be mainly attributed to the influence of the surface morphology and the changes of microstructure due to the phosphorus incorporation.
KeywordPhosphorus-doped Dlc FIlm Electrochemical Deposition Field Emission Behavior
Subject Area材料科学与物理化学
Funding Organizationthe National Natural Science Foundation of China (Grant No. 50772115;No. 50823008)
Indexed BySCI
Language英语
Funding Project低维材料摩擦学组 ; 纳米润滑研究组
Citation statistics
Cited Times:14[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2007
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorWang LP(王立平); Xue QJ(薛群基)
Recommended Citation
GB/T 7714
Wan SH,Wang LP,Zhang JY,et al. Field emission properties of DLC and phosphorus-doped DLC films prepared by electrochemical deposition process[J]. Applied Surface Science,2009,255:3817-3821.
APA 万善宏,王立平,张俊彦,&薛群基.(2009).Field emission properties of DLC and phosphorus-doped DLC films prepared by electrochemical deposition process.Applied Surface Science,255,3817-3821.
MLA 万善宏,et al."Field emission properties of DLC and phosphorus-doped DLC films prepared by electrochemical deposition process".Applied Surface Science 255(2009):3817-3821.
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