| Influence of microstructure on electrochemical properties of Si/C multilayer thin-film anodes deposited using a sputtering method | |
| Department | 固体润滑国家重点实验室 |
| Wang, Yunfeng1,2; Lv, Lili1; Wang, Jun1,3; Yan, De1; Geng, Baisong1; Wu, Zhiguo1; Zhuo, Renfu1 | |
| 2015 | |
| Source Publication | Materials Letters
 |
| ISSN | 0167-577X |
| Volume | 160Pages:210-212 |
| Abstract | Si/C multilayer films with different crystal structures were deposited on Cu substrate using magnetic sputtering, and the diffusion behaviors of Li+ in the films were compared to those of XRD, SEM, and electrochemical cycling. The results show that Li+ can completely diffuse into a 300 nm amorphous Si/C multilayer thin film under a charge/discharge current of 350 μA cm−2, while in the case of crystallized films with [311] preferred orientation, a poor diffusion character was observed even under a current of 273 μA cm−2. |
| Keyword | Si/c Multilayer Films Li++ Diffusion Preferred Orientation |
| Subject Area | 材料科学与物理化学 |
| DOI | 10.1016/j.matlet.2015.07.084 |
| Funding Organization | the National Natural Science Foundation of China (Grant no. 11204114);the basic scientific research business expenses of the Finance Department of Gansu Province (214140);the basic scientific research business expenses of the central university and Open Project of Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University (LZUMMM2014013) |
| Indexed By | SCI |
| If | 2.437 |
| Language | 英语 |
| compositor | 第三作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/19085 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Wang, Jun |
| Affiliation | 1.Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 730000, Peoples R China 2.Lanzhou Jiaotong Univ, Lanzhou 730070, Peoples R China 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
| Recommended Citation GB/T 7714 | Wang, Yunfeng,Lv, Lili,Wang, Jun,et al. Influence of microstructure on electrochemical properties of Si/C multilayer thin-film anodes deposited using a sputtering method[J]. Materials Letters,2015,160:210-212. |
| APA | Wang, Yunfeng.,Lv, Lili.,Wang, Jun.,Yan, De.,Geng, Baisong.,...&Zhuo, Renfu.(2015).Influence of microstructure on electrochemical properties of Si/C multilayer thin-film anodes deposited using a sputtering method.Materials Letters,160,210-212. |
| MLA | Wang, Yunfeng,et al."Influence of microstructure on electrochemical properties of Si/C multilayer thin-film anodes deposited using a sputtering method".Materials Letters 160(2015):210-212. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 1-s2.0-S0167577X1530（1420KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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