Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass
Department先进润滑与防护材料研究发展中心
Wang, Linqing1,4; Wang, Weiyan2; Huang, Jinhua2; Zeng, Yuheng2; Tan, Ruiqin3; Song, Weijie2; Chen JM(陈建敏)1; Chen JM(陈建敏)
The second department固体润滑国家重点实验室
2014
Source PublicationJournal of Non-Crystalline Solids
ISSN0022-3093
Volume388Pages:86-90
AbstractHydrogenated microcrystalline silicon (mu c-Si:H) thin films were deposited on glass by magnetron sputtering at the substrate temperature of 100 degrees C and the hydrogen dilution ratio of 65%. The crystallinity and microstructure of thin films were systematically studied using Raman spectroscopy, X-ray diffraction (XRD), transmission electron microscopy (TEM), and Fourier transform infrared spectroscopy (FT-IR). The results showed that the mu c-Si:H thin film was amorphous and hydrogen-rich at the initial stage of the growth. This amorphous layer was crystallized during further growth. The crystallinity of thin films is not almost changed with the increase of thickness when the thickness of thin film exceeds 70 nm. Finally, the mu c-Si:H thin film without amorphous incubation layer was obtained. The possible growth mechanism of fabricating mu c-Si:H thin films without amorphous incubation layers was also discussed.
KeywordMu C-si:h Thin Films Magnetron Sputtering Amorphous Incubation Layers Low Temperature
Subject Area材料科学与物理化学
DOI10.1016/j.jnoncrysol.2014.01.038
Funding Organizationthe National Natural Science Foundation of China (Grant No. 61106096);the ZHejiang Provincial Natural Science Foundation of China (Grant No. LY12E02009);the Ningbo Natural Science Foundation (Grant No. 2012A610120)
Indexed BySCI
If1.766
Language英语
Funding Project磨损与表面工程课题组
compositor第一作者单位
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/18298
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
固体润滑国家重点实验室(LSL)
Corresponding AuthorChen JM(陈建敏)
Affiliation1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
3.Ningbo Univ, Fac Informat Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Wang, Linqing,Wang, Weiyan,Huang, Jinhua,et al. Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass[J]. Journal of Non-Crystalline Solids,2014,388:86-90.
APA Wang, Linqing.,Wang, Weiyan.,Huang, Jinhua.,Zeng, Yuheng.,Tan, Ruiqin.,...&陈建敏.(2014).Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass.Journal of Non-Crystalline Solids,388,86-90.
MLA Wang, Linqing,et al."Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass".Journal of Non-Crystalline Solids 388(2014):86-90.
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