| Molecular dynamical simulations on a-C:H film growth from atomic flux of C and H: Effect of H fraction | |
| Department | 固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心 |
Quan WL(权伟龙); Li HX(李红轩) ; Zhao F(赵飞); Ji L(吉利); Du W(杜雯); Zhou HD(周惠娣); Chen JM(陈建敏)
| |
| 2010 | |
| Source Publication | Physics Letters A
 |
| ISSN | 0375-9601 |
| Volume | 374Issue:21Pages:2150-2155 |
| Abstract | Molecular dynamical simulations are carried out to studying the hydrogenated amorphous carbon (a-C:H) film growth from C and H atoms. The effects of the H fraction in source atoms and incident energy on the film formation are investigated. Our simulations show that almost all the H atoms incorporating into the films bond to carbon and the amount of H2 molecules is very slight. Increasing the H fraction in source atoms raises the sp3-C fraction, leads to a linear increase of H concentration in film, but decreases the film growth rate. The influence of H fraction on the film growth mechanism is also discussed. |
| Keyword | Hydrogenated Carbon Film h Fraction Deposition Mechanism Molecular Dynamical Simulation |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant No. 50705093, No. 50575217);the Innovative Group Foundation from NSFC (Grant No.50421502);the National 973 Project (No. 2007 CB607601) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/1053 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Chen JM(陈建敏) |
| Recommended Citation GB/T 7714 | Quan WL,Li HX,Zhao F,et al. Molecular dynamical simulations on a-C:H film growth from atomic flux of C and H: Effect of H fraction[J]. Physics Letters A,2010,374(21):2150-2155. |
| APA | 权伟龙.,李红轩.,赵飞.,吉利.,杜雯.,...&陈建敏.(2010).Molecular dynamical simulations on a-C:H film growth from atomic flux of C and H: Effect of H fraction.Physics Letters A,374(21),2150-2155. |
| MLA | 权伟龙,et al."Molecular dynamical simulations on a-C:H film growth from atomic flux of C and H: Effect of H fraction".Physics Letters A 374.21(2010):2150-2155. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 20102150-2155.pdf（2138KB） | 开放获取 | License | View Application Full Text | |||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment